Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO 2/indium tin oxide-coated glass substrates

Jost W. Lussi; Clarence Tang; Pierre Andre Kuenzi; Urs Staufer; Gabor Csucs; Janos Vörös; Gaudenz Danuser; Jeffrey A. Hubbell; Marcus Textor

doi:10.1088/0957-4484/16/9/062

Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO ₂/indium tin oxide-coated glass substrates

Jost W. Lussi, Clarence Tang, Pierre Andre Kuenzi, Urs Staufer, Gabor Csucs, Janos Vörös, Gaudenz Danuser, Jeffrey A. Hubbell, Marcus Textor

Research output: Contribution to journal › Review article › peer-review

44 Scopus citations

Abstract

The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly patterning (SMAP) on transparent glass substrates. In this paper we demonstrate that the use of thin films of conductive indium tin oxide resolves the issue of surface charging during e-beam writing while being compatible with the standard SMAP protocol for surface modification.

Original language	English (US)
Pages (from-to)	1781-1786
Number of pages	6
Journal	Nanotechnology
Volume	16
Issue number	9
DOIs	https://doi.org/10.1088/0957-4484/16/9/062
State	Published - Sep 1 2005

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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10.1088/0957-4484/16/9/062

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Lussi, J. W., Tang, C., Kuenzi, P. A., Staufer, U., Csucs, G., Vörös, J., Danuser, G., Hubbell, J. A., & Textor, M. (2005). Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO ₂/indium tin oxide-coated glass substrates. Nanotechnology, 16(9), 1781-1786. https://doi.org/10.1088/0957-4484/16/9/062

Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO ₂/indium tin oxide-coated glass substrates. / Lussi, Jost W.; Tang, Clarence; Kuenzi, Pierre Andre et al.
In: Nanotechnology, Vol. 16, No. 9, 01.09.2005, p. 1781-1786.

Research output: Contribution to journal › Review article › peer-review

Lussi, JW, Tang, C, Kuenzi, PA, Staufer, U, Csucs, G, Vörös, J, Danuser, G, Hubbell, JA & Textor, M 2005, 'Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO ₂/indium tin oxide-coated glass substrates', Nanotechnology, vol. 16, no. 9, pp. 1781-1786. https://doi.org/10.1088/0957-4484/16/9/062

@article{1e0027c0566b4846ab53014ddf46ee20,

title = "Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO 2/indium tin oxide-coated glass substrates",

abstract = "The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly patterning (SMAP) on transparent glass substrates. In this paper we demonstrate that the use of thin films of conductive indium tin oxide resolves the issue of surface charging during e-beam writing while being compatible with the standard SMAP protocol for surface modification.",

author = "Lussi, {Jost W.} and Clarence Tang and Kuenzi, {Pierre Andre} and Urs Staufer and Gabor Csucs and Janos V{\"o}r{\"o}s and Gaudenz Danuser and Hubbell, {Jeffrey A.} and Marcus Textor",

year = "2005",

month = sep,

day = "1",

doi = "10.1088/0957-4484/16/9/062",

language = "English (US)",

volume = "16",

pages = "1781--1786",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing Ltd.",

number = "9",

}

TY - JOUR

T1 - Selective molecular assembly patterning at the nanoscale

T2 - A novel platform for producing protein patterns by electron-beam lithography on SiO 2/indium tin oxide-coated glass substrates

AU - Lussi, Jost W.

AU - Tang, Clarence

AU - Kuenzi, Pierre Andre

AU - Staufer, Urs

AU - Csucs, Gabor

AU - Vörös, Janos

AU - Danuser, Gaudenz

AU - Hubbell, Jeffrey A.

AU - Textor, Marcus

PY - 2005/9/1

Y1 - 2005/9/1

N2 - The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly patterning (SMAP) on transparent glass substrates. In this paper we demonstrate that the use of thin films of conductive indium tin oxide resolves the issue of surface charging during e-beam writing while being compatible with the standard SMAP protocol for surface modification.

AB - The creation of geometrically well-defined submicron structures on insulating substrates by e-beam lithography is hampered by surface charging. This problem becomes crucial when trying to create nanosized protein patterns by selective molecular assembly patterning (SMAP) on transparent glass substrates. In this paper we demonstrate that the use of thin films of conductive indium tin oxide resolves the issue of surface charging during e-beam writing while being compatible with the standard SMAP protocol for surface modification.

UR - http://www.scopus.com/inward/record.url?scp=23444431581&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=23444431581&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/16/9/062

DO - 10.1088/0957-4484/16/9/062

M3 - Review article

AN - SCOPUS:23444431581

SN - 0957-4484

VL - 16

SP - 1781

EP - 1786

JO - Nanotechnology

JF - Nanotechnology

IS - 9

ER -

Selective molecular assembly patterning at the nanoscale: A novel platform for producing protein patterns by electron-beam lithography on SiO ₂/indium tin oxide-coated glass substrates

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