Abstract
The use of a variable duty cycle, pulsed RF plasma, in lieu of a continuous wave (CW) plasma, is employed for plasma polymerization of diverse monomers. The monomers discussed in this work include vinyltrimethylsilane, perfluoro-2-butyl tetrahydrofuran, and dichloro-methane. For each of these monomers, progressive changes in the molecular composition of the plasma deposited films are observed with systematic changes in the pulsed RF duty cycle employed during the deposition step, all other plasma variables being maintained constant. Significantly different film chemistry and deposition rates are observed in contrasting CW with equivalent wattage pulsed plasmas. Overall, the results obtained indicate that the use of variable duty cycle pulsed RF plasmas offer a promising approach to molecular tailoring of the film chemistry which occurs during plasma polymerizations.
| Original language | English (US) |
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| Title of host publication | Journal of Applied Polymer Science: Applied Polymer Symposium |
| Publisher | John Wiley & Sons Inc |
| Pages | 123-141 |
| Number of pages | 19 |
| Edition | 54 |
| State | Published - 1994 |
| Event | Proceedings of the American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications - Denver, CO, USA Duration: Mar 28 1993 → Mar 29 1993 |
Other
| Other | Proceedings of the American Chemical Society Symposium on Plasma Deposition of Polymeric Thin Films: Chemistry, Characterization, and Applications |
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| City | Denver, CO, USA |
| Period | 3/28/93 → 3/29/93 |
ASJC Scopus subject areas
- Engineering(all)